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Chemical vapor deposition machines Detailed ConsultingHFCVD-650 Hot-filament Chemical Vapor Deposition Diamond Machine (preparation of diamond thick film / diamond-like carbon films / off-the-shelf)
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| Product | HFCVD-650 Hot-filament Chemical Vapor Deposition Diamond Machine |
|---|---|
| Size of the deposition chamber | 650 mm×H600 mm |
| Size of the substrate table | 200 mm×H44 mm |
| Height of the substrate table | 150-200mm |
| Rotation speed of the substrate table | 0-20RPM (adjustable) |
| Electrode size | 24mm×200mm |
| Electrode current | > 300A |
| Film type | thick diamond film, diamond-like films, SiN film and SiO film, etc |
| Structure of vacuum chamber | Vertical front-opened door and the rear exhaust system, double-layer cooling water |
| Ultimate vacuum degree | 8.0×10-5Pa |
| Vacuum system | Turbo-molecular pump + mechanical pump + maintain pump |
| Vacuum measurement | Two low one high figures show composite vacuum gauge, film pressure instrument |
| Control system | Button manual control, PLC automatic hand-matching or computer control |
| Vacuum speed | Pumped from the atmosphere to 10-3Pa20min |
| Gas process control | 3 ways process gas flow control and display system |
| Alarm and protection | It can alarm and implement the appropriate protection measures for abnormal situations, such as water shortages of pump and electrodes, over-current and over-voltage, open circuit. |
| Optional parts | Cooling circulating water machine |
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